Method for optical proximity correction in which consistency is maintained and method for manufacturing mask using the same

    公开(公告)号:US11150551B2

    公开(公告)日:2021-10-19

    申请号:US16855083

    申请日:2020-04-22

    Abstract: A computer-readable medium includes a program code that, when executed by a processing circuitry, causes the processing circuitry to divide a layout of a semiconductor chip into a plurality of patches, generate a plurality of segments from a layout of each of the plurality of patches, wherein a first patch of the plurality of patches includes first segments and a second patch of the plurality of patches includes second segments, calculate hash values respectively corresponding to the first segments and the second segments by using a hash function, calculate bias values of segments having a first hash value from among the first segments, calculate a representative value based on the bias values, and apply the representative value to the segments having the first hash value from among the first segments.

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