Invention Grant
- Patent Title: Structure of micro-electro-mechanical-system microphone and method for fabricating the same
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Application No.: US16673962Application Date: 2019-11-05
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Publication No.: US11172287B2Publication Date: 2021-11-09
- Inventor: Tsung-Min Hsieh , Cheng-Wei Tsai , Chien-Hsing Lee
- Applicant: Solid State System Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Solid State System Co., Ltd.
- Current Assignee: Solid State System Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: H04R1/24
- IPC: H04R1/24 ; H04R3/00 ; B81B3/00

Abstract:
A structure of micro-electro-mechanical-system microphone includes a substrate of semiconductor, having a first opening in the substrate. A dielectric layer is disposed on the substrate, the dielectric layer has a second opening, corresponding to the first opening. A diaphragm is located within the second opening, having an embedded part held by the dielectric layer and an exposed part exposed by the second opening. The exposed part has a junction peripheral region, a buffer peripheral region and a central region. The junction region has an elastic structure with slits, the buffer peripheral region includes a plurality of holes and is disposed between the junction peripheral region and the central region. A backplate is disposed on the dielectric layer above the second opening, wherein the backplate includes venting holes distributed at a region corresponding to the central part of the diaphragm.
Public/Granted literature
- US20210136483A1 STRUCTURE OF MICRO-ELECTRO-MECHANICAL-SYSTEM MICROPHONE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2021-05-06
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