Invention Grant
- Patent Title: Method for manufacturing deposition mask, method for manufacturing display device and deposition mask
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Application No.: US16816181Application Date: 2020-03-11
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Publication No.: US11180843B2Publication Date: 2021-11-23
- Inventor: Shunsuke Sato , Reiji Terada , Naoko Mikami
- Applicant: TOPPAN PRINTING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee: TOPPAN PRINTING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Squire Patton Boggs (US) LLP
- Priority: JPJP2017-178223 20170915
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C23C14/04 ; C23C14/58

Abstract:
A method includes: sandwiching a plastic layer between a glass substrate and a metal plate made of an iron-nickel alloy and joining the metal plate to the glass substrate with the plastic layer in between; forming a mask portion including a plurality of mask holes from the metal plate; joining a surface of the mask portion that is opposite to a surface of the mask portion that is in contact with the plastic layer to a mask frame, which has a higher rigidity than the mask portion and is in a shape of a frame surrounding the mask holes of the mask portion; and peeling off the plastic layer and the glass substrate from the mask portion.
Public/Granted literature
- US20200208251A1 METHOD FOR MANUFACTURING DEPOSITION MASK, METHOD FOR MANUFACTURING DISPLAY DEVICE AND DEPOSITION MASK Public/Granted day:2020-07-02
Information query
IPC分类: