公开(公告)号：US11746407B2

公开(公告)日：2023-09-05

申请号：US17510345

申请日：2021-10-25

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Shunsuke Sato ,  Reiji Terada ,  Naoko Mikami

IPC: H01L51/00 ,  C23C14/04 ,  C23C14/58 ,  H10K71/16

CPC classification number: C23C14/042 ,  C23C14/588 ,  C23C14/5813 ,  H10K71/166

Abstract: A method includes: sandwiching a plastic layer between a glass substrate and a metal plate made of an iron-nickel alloy and joining the metal plate to the glass substrate with the plastic layer in between; forming a mask portion including a plurality of mask holes from the metal plate; joining a surface of the mask portion that is opposite to a surface of the mask portion that is in contact with the plastic layer to a mask frame, which has a higher rigidity than the mask portion and is in a shape of a frame surrounding the mask holes of the mask portion; and peeling off the plastic layer and the glass substrate from the mask portion.

公开(公告)号：US10273569B2

公开(公告)日：2019-04-30

申请号：US15786463

申请日：2017-10-17

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Sumika Tamura ,  Naoko Mikami ,  Daisei Fujito ,  Kiyoaki Nishitsuji ,  Takehiro Nishi

IPC: H01L51/00 ,  H01L51/50 ,  H01L51/52 ,  C23C14/02 ,  C23C14/04 ,  C23C14/08 ,  C23C14/12 ,  C23C14/22 ,  C23F1/02 ,  C23F1/44 ,  G01N21/55 ,  G03F7/00 ,  C23F1/14

Abstract: A metal mask substrate includes a metal surface to which a resist is to be disposed. A specular reflectance of incident light to the surface is 45.2% or more.

公开(公告)号：US20200208251A1

公开(公告)日：2020-07-02

申请号：US16816181

申请日：2020-03-11

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Shunsuke Sato ,  Reiji Terada ,  Naoko Mikami

IPC: C23C14/04 ,  H01L51/00 ,  C23C14/58

Abstract: A method includes: sandwiching a plastic layer between a glass substrate and a metal plate made of an iron-nickel alloy and joining the metal plate to the glass substrate with the plastic layer in between; forming a mask portion including a plurality of mask holes from the metal plate; joining a surface of the mask portion that is opposite to a surface of the mask portion that is in contact with the plastic layer to a mask frame, which has a higher rigidity than the mask portion and is in a shape of a frame surrounding the mask holes of the mask portion; and peeling off the plastic layer and the glass substrate from the mask portion.

公开(公告)号：US11746423B2

公开(公告)日：2023-09-05

申请号：US17390579

申请日：2021-07-30

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Naoko Mikami ,  Sumika Tamura ,  Reiji Terada ,  Masashi Kurata ,  Daisei Fujito ,  Kiyoaki Nishitsuji ,  Takehiro Nishi

IPC: C23F1/28 ,  C23C14/24 ,  C23C14/34 ,  C23F1/16 ,  H10K71/20 ,  C23F1/02 ,  C23F1/04 ,  B21B1/22 ,  B21B3/02 ,  B32B15/01 ,  B32B15/04 ,  C23C14/04 ,  C23C16/04 ,  C23F1/40

CPC classification number: C23F1/28 ,  B21B1/227 ,  B21B3/02 ,  B32B15/015 ,  B32B15/04 ,  C23C14/042 ,  C23C14/24 ,  C23C14/34 ,  C23C16/042 ,  C23F1/02 ,  C23F1/04 ,  C23F1/16 ,  C23F1/40 ,  H10K71/211 ,  B21B2261/04

Abstract: A rolled metal sheet includes an obverse surface and a reverse surface that is a surface located opposite to the obverse surface. At least either one of the obverse surface and the reverse surface is a processing object. A method for manufacturing a metal mask substrate includes reducing a thickness of the rolled metal sheet to 10 μm or less by etching the processing object by 3 μm or more by use of an acidic etching liquid, and roughening the processing object so that the processing object becomes a resist formation surface that has a surface roughness Rz of 0.2 μm or more, thereby obtaining a metal mask sheet.

公开(公告)号：US11453940B2

公开(公告)日：2022-09-27

申请号：US17013535

申请日：2020-09-04

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Sumika Tamura ,  Mikio Shinno ,  Daisei Fujito ,  Kiyoaki Nishitsuji ,  Takehiro Nishi ,  Naoko Mikami

IPC: C23C14/04 ,  C25D1/04 ,  C25B11/055 ,  C25C1/08 ,  C25C7/08 ,  C25D1/10 ,  C25D11/34 ,  H01L51/00 ,  C25D3/56

Abstract: A vapor deposition metal mask substrate includes a nickel-containing metal sheet including a obverse surface and a reverse surface, which is opposite to the obverse surface. At least one of the obverse surface and the reverse surface is a target surface for placing a resist layer. The target surface has a surface roughness Sa of less than or equal to 0.019 μm. The target surface has a surface roughness Sz of less than or equal to 0.308 μm.

公开(公告)号：US11180843B2

公开(公告)日：2021-11-23

申请号：US16816181

申请日：2020-03-11

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Shunsuke Sato ,  Reiji Terada ,  Naoko Mikami

IPC: H01L51/00 ,  C23C14/04 ,  C23C14/58

Abstract: A method includes: sandwiching a plastic layer between a glass substrate and a metal plate made of an iron-nickel alloy and joining the metal plate to the glass substrate with the plastic layer in between; forming a mask portion including a plurality of mask holes from the metal plate; joining a surface of the mask portion that is opposite to a surface of the mask portion that is in contact with the plastic layer to a mask frame, which has a higher rigidity than the mask portion and is in a shape of a frame surrounding the mask holes of the mask portion; and peeling off the plastic layer and the glass substrate from the mask portion.

公开(公告)号：US11111585B2

公开(公告)日：2021-09-07

申请号：US15786446

申请日：2017-10-17

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Naoko Mikami ,  Sumika Tamura ,  Reiji Terada ,  Masashi Kurata ,  Daisei Fujito ,  Kiyoaki Nishitsuji ,  Takehiro Nishi

IPC: C23F1/28 ,  C23C14/24 ,  C23C14/34 ,  C23F1/16 ,  B21B1/22 ,  B21B3/02 ,  B32B15/01 ,  B32B15/04 ,  C23C14/04 ,  C23C16/04 ,  C23F1/40 ,  H01L51/00

Abstract: A rolled metal sheet includes an obverse surface and a reverse surface that is a surface located opposite to the obverse surface. At least either one of the obverse surface and the reverse surface is a processing object. A method for manufacturing a metal mask substrate includes reducing a thickness of the rolled metal sheet to 10 μm or less by etching the processing object by 3 μm or more by use of an acidic etching liquid, and roughening the processing object so that the processing object becomes a resist formation surface that has a surface roughness Rz of 0.2 μm or more, thereby obtaining a metal mask sheet.

公开(公告)号：US10767266B2

公开(公告)日：2020-09-08

申请号：US16025857

申请日：2018-07-02

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Mikio Shinno ,  Reiji Terada ,  Kiyoaki Nishitsuji ,  Masashi Kurata ,  Kenta Takeda ,  Naoko Mikami ,  Sumika Akiyama

IPC: B21D1/00 ,  C23F1/02 ,  C23F1/28 ,  C23C14/24 ,  B21B1/38 ,  C23C14/04 ,  C23F1/16

Abstract: The ratio of the difference between a surface distance L at each of the different positions in a width direction DW of a metal sheet and a minimum surface distance Lm to the minimum surface distance Lm is an elongation difference ratio. The elongation difference ratio in a center section in the width direction DW of the metal sheet is less than or equal to 3×10−5. The elongation difference ratios in two edge sections in the width direction DW of the metal sheet are less than or equal to 15×10−5. The elongation difference ratio in at least one of the two edge sections in the width direction DW of the metal sheet is less than the elongation difference ratio in the center section in the width direction of the metal sheet.