Invention Grant
- Patent Title: Electronic substrates having embedded dielectric magnetic material to form inductors
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Application No.: US15856547Application Date: 2017-12-28
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Publication No.: US11189409B2Publication Date: 2021-11-30
- Inventor: Andrew J. Brown , Prithwish Chatterjee , Lauren A. Link , Sai Vadlamani
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Essential Patents Group, LLP.
- Main IPC: H01L21/48
- IPC: H01L21/48 ; H01F1/20 ; H01L23/498 ; H01F41/02 ; H05K1/18 ; H01F1/37 ; H01F1/28 ; H01L23/00

Abstract:
An inductor may be fabricated comprising a magnetic material layer and an electrically conductive via or trace extending through the magnetic material layer, wherein the magnetic material layer comprises dielectric magnetic filler particles within a carrier material. Further embodiments may include incorporating the inductor of the present description into an electronic substrate and may further include an integrated circuit device attached to the electronic substrate and the electronic substrate may further be attached to a board, such as a motherboard.
Public/Granted literature
- US20190206597A1 ELECTRONIC SUBSTRATES HAVING EMBEDDED DIELECTRIC MAGNETIC MATERIAL TO FORM INDUCTORS Public/Granted day:2019-07-04
Information query
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