公开(公告)号：US12057252B2

公开(公告)日：2024-08-06

申请号：US17029870

申请日：2020-09-23

申请人： Intel Corporation

发明人： Benjamin Duong ,  Michael Garelick ,  Darko Grujicic ,  Tarek Ibrahim ,  Brandon C. Marin ,  Sai Vadlamani ,  Marcel Wall

IPC分类号： H05K1/02 ,  H01F1/37 ,  H01F17/04 ,  H01F17/06 ,  H01F27/24 ,  H01F27/245 ,  H01F27/28 ,  H01F27/29 ,  H01F41/24 ,  H01F41/32 ,  H01L23/15 ,  H01L23/498 ,  H01L23/64 ,  H05K1/09 ,  H05K3/02 ,  H05K3/42

CPC分类号： H01F27/2804 ,  H01F41/32 ,  H01L23/49827 ,  H01L23/645 ,  H01F2027/2809 ,  H01L23/49816

摘要： An electronic substrate may be fabricated by forming a base substrate and forming an inductor extending through the base substrate, wherein the inductor includes a magnetic material layer and a barrier layer, such that the barrier layer prevents the magnetic material layer from leaching into plating solutions during the fabrication of the electronic substrate. In one embodiment, the barrier material may comprise titanium. In another embodiment, the barrier layer may comprise a polymeric material. In still another embodiment, the barrier layer may comprise a nitride material layer. The inductor may further include a plating seed layer on the barrier layer and a conductive fill material abutting the plating seed layer.

公开(公告)号：US20220406512A1

公开(公告)日：2022-12-22

申请号：US17352952

申请日：2021-06-21

申请人： Intel Corporation

发明人： Xin Ning ,  Kyu-oh Lee ,  Brent Williams ,  Brandon C. Marin ,  Tarek A. Ibrahim ,  Krishna Bharath ,  Sai Vadlamani

IPC分类号： H01F27/255 ,  H01F27/29 ,  H01F27/28 ,  H01F41/04 ,  H01F41/02

摘要： Techniques and mechanisms for providing structures of a magnetic material based inductor. In an embodiment, an inductor comprises a body of a magnetic material, and a conductor which extends along a surface of the body. The body comprises a carrier material and magnetic filler particles distributed in the carrier material. A passivation material of the inductor is provided adjacent to the conductor and to surfaces of the filler particles. The conductor and the passivation material comprise different respective material compositions, wherein the passivation material comprises one of nickel, tin, copper, palladium, or gold. In another embodiment, the inductor is one of a plated through hole inductor type of a planar inductor type.

公开(公告)号：US11355459B2

公开(公告)日：2022-06-07

申请号：US15982652

申请日：2018-05-17

申请人： Intel Corporation

发明人： Kyu-Oh Lee ,  Sai Vadlamani ,  Rahul Jain ,  Junnan Zhao ,  Ji Yong Park ,  Cheng Xu ,  Seo Young Kim

IPC分类号： H01L23/60 ,  H01L23/64 ,  H01L23/498 ,  H01L21/48 ,  H01L23/00 ,  H01F1/12 ,  H01F41/14

摘要： Techniques for fabricating a semiconductor package having magnetic materials embedded therein are described. For one technique, fabrication of package includes: forming a pad and a conductive line on a build-up layer; forming a raised pad structure on the build-up layer, the raised pad comprising a pillar structure on the pad; encapsulating the conductive line and the raised pad structure in a magnetic film comprising one or more magnetic fillers; planarizing a top surface of the magnetic film until top surfaces of the raised pad structure and the magnetic film are co-planar; depositing a primer layer on the top surfaces; removing one or more portions of the primer layer above the raised pad structure to create an opening; and forming a via in the opening on the raised pad structure. The primer layer may comprise one or more of a build-up layer, a photoimageable dielectric layer, and a metal mask.

公开(公告)号：US10692965B2

公开(公告)日：2020-06-23

申请号：US16142817

申请日：2018-09-26

申请人： Intel Corporation

发明人： Chong Zhang ,  Andrew J. Brown ,  Sheng Li ,  Sai Vadlamani ,  Ying Wang

IPC分类号： H01L27/08 ,  H01L49/02 ,  H01F27/28 ,  C09D11/52 ,  H01L23/522 ,  G05F1/625

摘要： Methods of forming an inductor using dry processes are described. A cavity is laser drilled in an insulator. A first magnetic material layer is printed in the cavity. An Ag conductive ink is printed on the first magnetic material layer and a second magnetic material layer printed on the ink. The ink has a trace sandwiched between the first and second magnetic material layers that provides a majority of the inductance of the inductor. A protective insulating layer protects the second magnetic material layer from a wet chemistry solution when contacts are formed to the ink. The second magnetic material layer and ink are deposited in or on the cavity.

公开(公告)号：US11862552B2

公开(公告)日：2024-01-02

申请号：US17567639

申请日：2022-01-03

申请人： INTEL CORPORATION

发明人： Sai Vadlamani ,  Prithwish Chatterjee ,  Robert A. May ,  Rahul S. Jain ,  Lauren A. Link ,  Andrew J. Brown ,  Kyu Oh Lee ,  Sheng C. Li

IPC分类号： H01L23/498 ,  H01F17/00 ,  H01F41/04 ,  H05K1/00 ,  H01L23/00 ,  H01F27/28 ,  H01F27/40 ,  H01L21/48

CPC分类号： H01L23/49838 ,  H01F17/0013 ,  H01F17/0033 ,  H01F27/2804 ,  H01F27/40 ,  H01F41/043 ,  H01F41/046 ,  H01L21/486 ,  H01L21/4853 ,  H01L21/4857 ,  H01L23/498 ,  H01L23/49811 ,  H01L23/49822 ,  H01L23/49866 ,  H01L24/19 ,  H01L24/20 ,  H05K1/00 ,  H01F2017/0066 ,  H01F2027/2809 ,  H01L24/16 ,  H01L24/48 ,  H01L24/81 ,  H01L2224/16157 ,  H01L2224/16227 ,  H01L2224/48227 ,  H01L2224/81191 ,  H01L2224/81192 ,  H01L2224/81193 ,  H01L2224/81447 ,  H01L2224/81815 ,  H01L2924/00014 ,  H01L2924/19042 ,  H01L2924/19102 ,  H01L2224/81815 ,  H01L2924/00014 ,  H01L2224/81447 ,  H01L2924/00014 ,  H01L2924/00014 ,  H01L2224/45099

摘要： Methods/structures of forming embedded inductor structures are described. Embodiments include forming a first interconnect structure on a dielectric material of a substrate, selectively forming a magnetic material on a surface of the first interconnect structure, forming an opening in the magnetic material, and forming a second interconnect structure in the opening. Build up layers are then formed on the magnetic material.

公开(公告)号：US11664290B2

公开(公告)日：2023-05-30

申请号：US17459993

申请日：2021-08-27

申请人： INTEL CORPORATION

发明人： Rahul Jain ,  Kyu Oh Lee ,  Siddharth K. Alur ,  Wei-Lun K. Jen ,  Vipul V. Mehta ,  Ashish Dhall ,  Sri Chaitra J. Chavali ,  Rahul N. Manepalli ,  Amruthavalli P. Alur ,  Sai Vadlamani

IPC分类号： H01L23/31 ,  H01L21/48 ,  H01L21/56 ,  H01L23/498 ,  H01L23/532 ,  H01L23/538 ,  H01L23/00 ,  H01L25/065

CPC分类号： H01L23/3185 ,  H01L21/4853 ,  H01L21/4857 ,  H01L21/563 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/5381 ,  H01L23/5383 ,  H01L23/5386 ,  H01L23/53295 ,  H01L24/06 ,  H01L24/13 ,  H01L24/16 ,  H01L24/81 ,  H01L25/0655 ,  H01L25/0657 ,  H01L2224/16227 ,  H01L2224/81 ,  H01L2224/83051 ,  H01L2924/18161

摘要： An apparatus is provided which comprises: a substrate, a die site on the substrate to couple with a die, a die side component site on the substrate to couple with a die side component, and a raised barrier on the substrate between the die and die side component sites to contain underfill material disposed at the die site, wherein the raised barrier comprises electroplated metal. Other embodiments are also disclosed and claimed.

公开(公告)号：US11610706B2

公开(公告)日：2023-03-21

申请号：US15870302

申请日：2018-01-12

申请人： Intel Corporation

发明人： Sai Vadlamani ,  Prithwish Chatterjee ,  Rahul Jain ,  Kyu Oh Lee ,  Sheng C. Li ,  Andrew J. Brown ,  Lauren A. Link

IPC分类号： H01F1/42 ,  H01F27/38 ,  B32B27/38 ,  C22C45/04 ,  H01F17/00 ,  H01L23/498 ,  H01F27/28 ,  H01L21/56 ,  H01F17/06

摘要： A substrate for an integrated circuit package, the substrate comprising a dielectric, at least one conductor plane within the dielectric, and a planar magnetic structure comprising an organic magnetic laminate embedded within the dielectric, wherein the planar magnetic structure is integrated within the at least one conductor plane.

公开(公告)号：US11552008B2

公开(公告)日：2023-01-10

申请号：US16202690

申请日：2018-11-28

申请人： Intel Corporation

发明人： Lauren Ashley Link ,  Andrew James Brown ,  Prithwish Chatterjee ,  Sai Vadlamani ,  Ying Wang ,  Chong Zhang

IPC分类号： H01L23/498 ,  H01L23/64 ,  H01L23/15

摘要： Disclosed herein are asymmetric cored integrated circuit (IC) package supports, and related devices and methods. For example, in some embodiments, an IC package support may include a core region having a first face and an opposing second face, a first buildup region at the first face of the core region, and a second buildup region at the second face of the core region. A thickness of the first buildup region may be different than a thickness of the second buildup region. In some embodiments, an inductor may be included in the core region.

公开(公告)号：US11417614B2

公开(公告)日：2022-08-16

申请号：US15938114

申请日：2018-03-28

申请人： Intel Corporation

发明人： Cheng Xu ,  Kyu-Oh Lee ,  Junnan Zhao ,  Rahul Jain ,  Ji Yong Park ,  Sai Vadlamani ,  Seo Young Kim

IPC分类号： H01L23/64 ,  H01L23/498 ,  H01L23/00 ,  H01L21/48

摘要： Embodiments include an electronic package that includes a first layer that comprises a dielectric material and a second layer over the first layer, where the second layer comprises a magnetic material. In an embodiment, a third layer is formed over the second layer, where the third layer comprises a dielectric material. In an embodiment, the third layer entirely covers a first surface of the second layer. In an embodiment a first conductive layer and a second conductive layer are embedded within the second layer. In an embodiment, sidewalls of the first conductive layer and the second conductive layer are substantially vertical.

公开(公告)号：US11251113B2

公开(公告)日：2022-02-15

申请号：US15855453

申请日：2017-12-27

申请人： Intel Corporation

发明人： Sai Vadlamani ,  Prithwish Chatterjee ,  Robert A. May ,  Rahul S. Jain ,  Lauren A. Link ,  Andrew J. Brown ,  Kyu Oh Lee ,  Sheng C. Li

IPC分类号： H01L21/48 ,  H01L23/498 ,  H01F17/00 ,  H01F41/04 ,  H05K1/00 ,  H01L23/00 ,  H01F27/28 ,  H01F27/40

摘要： Methods/structures of forming embedded inductor structures are described. Embodiments include forming a first interconnect structure on a dielectric material of a substrate, selectively forming a magnetic material on a surface of the first interconnect structure, forming an opening in the magnetic material, and forming a second interconnect structure in the opening. Build up layers are then formed on the magnetic material.