Invention Grant
- Patent Title: APCI ion source with asymmetrical spray
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Application No.: US16639411Application Date: 2018-08-10
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Publication No.: US11189477B2Publication Date: 2021-11-30
- Inventor: Thomas R. Covey , Peter Kovarik
- Applicant: DH Technologies Development Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: DH Technologies Development Pte. Ltd.
- Current Assignee: DH Technologies Development Pte. Ltd.
- Current Assignee Address: SG Singapore
- International Application: PCT/IB2018/056057 WO 20180810
- International Announcement: WO2019/034978 WO 20190221
- Main IPC: H01J49/16
- IPC: H01J49/16 ; H01J49/04 ; H01J49/14

Abstract:
Systems and methods for atmospheric pressure chemical ionization are provided herein. In various aspects, the APCI apparatus, systems, and methods can provide an asymmetric sample spray into a vaporization chamber asymmetrically (e.g., off axis from the longitudinal axis of the vaporization chamber) so as to increase the interaction of the molecules in the sample spray with the vaporization chamber's sidewalls (and expose more of the molecules to the heat generated thereby), which can thereby result in improved consistency and/or efficiency of ion formation, and/or increased sensitivity relative to conventional APCI techniques.
Public/Granted literature
- US20210134579A1 APCI Ion Source with Asymmetrical Spray Public/Granted day:2021-05-06
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