- 专利标题： Adjacent field alignment
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申请号： US16437167申请日： 2019-06-11
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公开(公告)号： US11199772B2公开(公告)日： 2021-12-14
- 发明人: Ian Matthew McMackin , Wesley Martin
- 申请人： Canon Nanotechnologies, Inc.
- 申请人地址： US TX Austin
- 专利权人： Canon Nanotechnologies, Inc.
- 当前专利权人： Canon Nanotechnologies, Inc.
- 当前专利权人地址： US TX Austin
- 代理商 Daniel Ratoff; Cameron A. King
- 主分类号： B29C59/02
- IPC分类号： B29C59/02 ; G03F7/00 ; B82Y10/00 ; B82Y40/00
摘要：
Methods for imprinting on abutted fields of a substrate are described. Generally, a first field of a substrate may be imprinted using an imprint lithography template. The template may then be placed such that a portion of the template overlaps the first field of the substrate while imprinting a second field of the substrate.
公开/授权文献
- US20190294041A1 ADJACENT FIELD ALIGNMENT 公开/授权日：2019-09-26
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