公开(公告)号：US20190294041A1

公开(公告)日：2019-09-26

申请号：US16437167

申请日：2019-06-11

申请人： Canon Nanotechnologies, Inc.

发明人： Ian Matthew McMackin ,  Wesley Martin

IPC分类号： G03F7/00 ,  B82Y10/00 ,  B82Y40/00

摘要： Methods for imprinting on abutted fields of a substrate are described. Generally, a first field of a substrate may be imprinted using an imprint lithography template. The template may then be placed such that a portion of the template overlaps the first field of the substrate while imprinting a second field of the substrate.

公开(公告)号：US11199772B2

公开(公告)日：2021-12-14

申请号：US16437167

申请日：2019-06-11

申请人： Canon Nanotechnologies, Inc.

发明人： Ian Matthew McMackin ,  Wesley Martin

IPC分类号： B29C59/02 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00

摘要： Methods for imprinting on abutted fields of a substrate are described. Generally, a first field of a substrate may be imprinted using an imprint lithography template. The template may then be placed such that a portion of the template overlaps the first field of the substrate while imprinting a second field of the substrate.