Invention Grant
- Patent Title: Substrate supporting unit and film forming device having the substrate supporting unit
-
Application No.: US16553988Application Date: 2019-08-28
-
Publication No.: US11201040B2Publication Date: 2021-12-14
- Inventor: Go Takahara , Toshihiko Hanamachi , Arata Tatsumi
- Applicant: NHK SPRING CO., LTD.
- Applicant Address: JP Yokohama
- Assignee: NHK SPRING CO., LTD.
- Current Assignee: NHK SPRING CO., LTD.
- Current Assignee Address: JP Yokohama
- Agency: Hauptman Ham, LLP
- Priority: JPJP2017-036608 20170228
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/67 ; H01L21/687 ; C23C16/458 ; C23C14/50 ; C23C14/54
Abstract:
A substrate supporting unit is provided. The substrate supporting unit possesses a shaft, a first heater, and a stage. The first heater is located in the shaft and is configured to heat an upper portion of the shaft. The stage is located over the shaft and includes a first plate, a second plate over the first plate, and a second heater between the first plate and the second plate.
Public/Granted literature
- US20190385827A1 SUBSTRATE SUPPORTING UNIT AND FILM FORMING DEVICE HAVING THE SUBSTRATE SUPPORTING UNIT Public/Granted day:2019-12-19
Information query
