Invention Grant
- Patent Title: Gas barrier film and method for producing gas barrier film
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Application No.: US16658372Application Date: 2019-10-21
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Publication No.: US11203180B2Publication Date: 2021-12-21
- Inventor: Eijiro Iwase
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPJP2017-099509 20170519
- Main IPC: B32B7/023
- IPC: B32B7/023 ; B32B7/12 ; B32B27/08 ; B32B27/32 ; B32B27/36 ; B32B37/12 ; B32B37/20 ; C08J5/12 ; H01L51/44 ; H01L51/52 ; C23C16/34 ; C23C16/50

Abstract:
A gas barrier film has, in sequence, a support, an inorganic layer disposed on one surface side of the support, an adhesive layer disposed on a surface of the inorganic layer, and a resin layer disposed on a surface of the adhesive layer in which the adhesive layer has a thickness of 15 μm or less, and the adhesion strength between the inorganic layer and the adhesive layer is 21 N/25 mm or more and 60 N/25 mm or less. A method for producing a gas barrier film includes an inorganic layer deposition step and a bonding step in a vacuum.
Public/Granted literature
- US11167526B2 Gas barrier film and method for producing gas barrier film Public/Granted day:2021-11-09
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