Invention Grant
- Patent Title: Particle suppression systems and methods
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Application No.: US16629349Application Date: 2018-07-18
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Publication No.: US11204558B2Publication Date: 2021-12-21
- Inventor: Yang-Shan Huang , Daniel Nathan Burbank , Marco Koert Stavenga
- Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
- Applicant Address: NL Veldhoven; NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee Address: NL Veldhoven; NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2018/069459 WO 20180718
- International Announcement: WO2019/020443 WO 20190131
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
An object stage that includes a first structure and a second structure movable relative to the first structure. The second structure is configured to support an object. The object stage also includes a seal plate movably coupled to the first structure or the second structure, but not both. Further, the object stage includes an actuator configured to move the seal plate such that a substantially constant gap is defined between the seal plate and the first structure or second structure that is not coupled to the seal plate.
Information query
IPC分类: