利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

16 条记录 (耗时 0.016 秒)

    Particle suppression systems and methods
    1.
    发明授权
    Particle suppression systems and methods 有权

    公开(公告)号：US11204558B2

    公开(公告)日：2021-12-21

    申请号：US16629349

    申请日：2018-07-18

    申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    发明人： Yang-Shan Huang ,  Daniel Nathan Burbank ,  Marco Koert Stavenga

    IPC分类号： G03F7/20

    摘要： An object stage that includes a first structure and a second structure movable relative to the first structure. The second structure is configured to support an object. The object stage also includes a seal plate movably coupled to the first structure or the second structure, but not both. Further, the object stage includes an actuator configured to move the seal plate such that a substantially constant gap is defined between the seal plate and the first structure or second structure that is not coupled to the seal plate.

    DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURFACE OF A PATTERNING DEVICE
    2.
    发明申请
    DETERMINING POSITION AND CURVATURE INFORMATION DIRECTLY FROM A SURFACE OF A PATTERNING DEVICE 有权
    确定位置和曲线信息直接从图案设备的表面

    公开(公告)号：US20140307246A1

    公开(公告)日：2014-10-16

    申请号：US14357514

    申请日：2013-05-31

    申请人： ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

    发明人： Mark Josef Schuster ,  Santiago E Del Puerto ,  Daniel Nathan Burbank ,  Duncan Walter Bromley ,  Franciscus Godefridus Casper Bijnen

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70775 ,  G03F1/14 ,  G03F1/142 ,  G03F1/38 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70783 ,  G03F7/7085

    摘要： Position and curvature information of a patterning device may be determined directly from the patterning device and controlled based on the determined information. In an embodiment, a lithographic apparatus includes a position determining system operative to determine a relative position of the patterning device. The patterning device may be configured to create a patterned radiation beam from a radiation beam incident on a major surface of the patterning device. The patterning device may have a side surface having an edge in common with the major surface. The position determining system may include an interferometer operative to transmit light to the side surface and to receive the transmitted light after the transmitted light has been reflected at the side surface. The position determining system is operative to determine a quantity representative of the relative position of the patterning device from the received reflected transmitted light.

    摘要翻译： 图案形成装置的位置和曲率信息可以直接从图案形成装置确定并基于所确定的信息进行控制。 在一个实施例中，光刻设备包括位置确定系统，其可操作以确定图案形成装置的相对位置。 图案形成装置可以被配置为从入射在图案形成装置的主表面上的辐射束产生图案化的辐射束。 图案形成装置可以具有与主表面共同的边缘的侧表面。 位置确定系统可以包括干涉仪，其操作以将光透射到侧表面，并且在透射光已经在侧表面被反射之后接收透射光。 位置确定系统用于确定代表图案形成装置相对于所接收的反射透射光的相对位置的量。

    Membrane assembly and particle trap
    5.
    发明授权
    Membrane assembly and particle trap 有权

    公开(公告)号：US10585359B2

    公开(公告)日：2020-03-10

    申请号：US16321059

    申请日：2017-07-17

    申请人： ASML Holding N.V. ,  ASML Netherlands B.V.

    发明人： Ronald Peter Albright ,  Lowell Lane Baker ,  Daniel Nathan Burbank

    IPC分类号： G03F7/20 ,  G03F1/24 ,  G03F1/64

    摘要： Particle trap assemblies configured to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. The particle trap may be a gap geometric particle trap located between a stationary part and a movable part of the lithography apparatus. The particle trap may also be a surface geometric particle trap located on a surface of a particle sensitive environment in lithography or metrology apparatus.

    Patterning Device Support and Lithographic Apparatus
    7.
    发明申请
    Patterning Device Support and Lithographic Apparatus 有权
    图案设备支持和平版印刷设备

    公开(公告)号：US20150277240A1

    公开(公告)日：2015-10-01

    申请号：US14436070

    申请日：2013-09-23

    申请人： ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

    发明人： Arindam Sinharoy ,  Stephen S. Roux ,  Jean-Philippe Xavier Van Damme ,  Daniel Nathan Burbank ,  Mark Josef Schuster ,  Duncan Harris ,  Christopher Charles Ward

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70733 ,  G03F7/707 ,  G03F7/70783

    摘要： A patterning device support (200), for example, a patterning device (202) or substrate support, can be configured to release internal stresses of a patterning device loaded thereon. The patterning device support can include a positive pressuring generating interface (206a, 206b) or an acoustic vibration generating interface (206a, 206b), or can be configured to oscillate while at least a portion of patterning device is decoupled from the patterning device support. A method of transferring a patterning device between a patterning device handling apparatus and a patterning device support configured to move the patterning device can include positioning the patterning device onto a surface of the patterning device support, and performing a process that releases internal stress of the patterning device.

    摘要翻译： 图案形成装置支撑件（200），例如，图案形成装置（202）或基板支撑件可以构造成释放装载在其上的图案形成装置的内部应力。 图案形成装置支撑件可以包括正压力生成界面（206a，206b）或声振动产生界面（206a，206b），或者可以被配置为在图案形成装置的至少一部分与图案形成装置支撑件分离的同时进行摆动。 在图案形成装置处理装置和被构造成移动图案形成装置的图案形成装置支撑件之间传送图案形成装置的方法可以包括将图案形成装置定位在图案形成装置支撑件的表面上，并且执行释放图案形成装置的内部应力 设备。