Invention Grant
- Patent Title: Deposition system with a multi-cathode
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Application No.: US16444560Application Date: 2019-06-18
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Publication No.: US11230761B2Publication Date: 2022-01-25
- Inventor: Vibhu Jindal , Sanjay Bhat
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C23C14/35
- IPC: C23C14/35 ; C23C14/04 ; C23C14/34 ; C23C14/18 ; H01J37/34
Abstract:
A deposition system, and a method of operation thereof are disclosed. The deposition system comprises a cathode assembly comprising a rotating magnet assembly including a plurality of outer peripheral magnets surrounding an inner peripheral magnet.
Public/Granted literature
- US20190382881A1 Deposition System With A Multi-Cathode Public/Granted day:2019-12-19
Information query
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