- 专利标题: Electrode structure for field effect transistor
-
申请号: US16381485申请日: 2019-04-11
-
公开(公告)号: US11239326B2公开(公告)日: 2022-02-01
- 发明人: Jeffrey R. LaRoche , Kelly P. Ip , Thomas E. Kazior , Kamal Tabatabaie Alavi
- 申请人: Raytheon Company
- 申请人地址: US MA Waltham
- 专利权人: Raytheon Company
- 当前专利权人: Raytheon Company
- 当前专利权人地址: US MA Waltham
- 代理机构: Daly, Crowley, Mofford & Durkee, LLP
- 主分类号: H01L29/40
- IPC分类号: H01L29/40 ; H01L21/285 ; H01L23/48 ; H01L23/485 ; H01L29/417 ; H01L29/45 ; H01L29/66 ; H01L29/778 ; H01L29/20 ; H01L23/535 ; H01L21/28 ; H01L29/423 ; H01L23/532 ; H01L29/51
摘要:
A Field Effect Transistor (FET) structure having: a semiconductor; a first electrode structure; a second electrode structure; and a third electrode structure for controlling a flow of carriers in the semiconductor between the first electrode structure and the second electrode structure; a dielectric structure disposed over the semiconductor and extending horizontally between first electrode structure, the second electrode structure and the third electrode structure; and a fourth electrode passing into the dielectric structure and terminating a predetermined, finite distance above the semiconductor for controlling an electric field in the semiconductor under the fourth electrode structure.
公开/授权文献
- US20190237554A1 ELECTRODE STRUCTURE FOR FIELD EFFECT TRANSISTOR 公开/授权日:2019-08-01
信息查询
IPC分类: