Invention Grant
- Patent Title: Orientation characteristic measurement method, orientation characteristic measurement program, and orientation characteristic measurement device
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Application No.: US16613996Application Date: 2017-11-22
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Publication No.: US11243073B2Publication Date: 2022-02-08
- Inventor: Kiyotada Hosokawa , Shigeru Eura
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu
- Agency: Faegre Drinker Biddle & Reath LLP
- Priority: JPJP2017-101926 20170523
- International Application: PCT/JP2017/042073 WO 20171122
- International Announcement: WO2018/216246 WO 20181129
- Main IPC: G01B11/26
- IPC: G01B11/26

Abstract:
An orientation characteristic measurement system includes an irradiation optical system, a detection optical system, a light detector, a rotation mechanism changing an angle (ϕ) between a surface of the sample and an optical axis (L2) of the detection optical system, and a computer, and the computer includes a rotation mechanism control unit controlling the rotation mechanism, a distribution acquisition unit normalizing an angle-dependent distribution of light intensity to acquire an angle-dependent distribution of light intensity, an area specifying unit specifying light intensity in a maximum area on the basis of the angle-dependent distribution of the light intensity, and a parameter calculation unit calculating the orientation parameter (S) on the basis of a linear relationship determined using the film thickness and refractive index of the sample and the light intensity in the maximum area.
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