公开(公告)号：US11920921B2

公开(公告)日：2024-03-05

申请号：US17517049

申请日：2021-11-02

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Kiyotada Hosokawa ,  Shigeru Eura

IPC: G01B11/26

CPC classification number: G01B11/26

Abstract: An orientation characteristic measurement system (1) includes an irradiation optical system (5), a detection optical system (11), a light detector (13), a rotation mechanism (9) changing an angle (ϕ) between a surface of the sample and an optical axis (L2) of the detection optical system (11), and a computer (15), and the computer (15) includes a rotation mechanism control unit (32) controlling the rotation mechanism (9), a distribution acquisition unit (34) normalizing an angle-dependent distribution of light intensity to acquire an angle-dependent distribution of light intensity, an area specifying unit (35) specifying light intensity in a maximum area on the basis of the angle-dependent distribution of the light intensity, and a parameter calculation unit (36) calculating the orientation parameter (S) on the basis of a linear relationship determined using the film thickness and refractive index of the sample and the light intensity in the maximum area.

公开(公告)号：US11243073B2

公开(公告)日：2022-02-08

申请号：US16613996

申请日：2017-11-22

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Kiyotada Hosokawa ,  Shigeru Eura

IPC: G01B11/26

Abstract: An orientation characteristic measurement system includes an irradiation optical system, a detection optical system, a light detector, a rotation mechanism changing an angle (ϕ) between a surface of the sample and an optical axis (L2) of the detection optical system, and a computer, and the computer includes a rotation mechanism control unit controlling the rotation mechanism, a distribution acquisition unit normalizing an angle-dependent distribution of light intensity to acquire an angle-dependent distribution of light intensity, an area specifying unit specifying light intensity in a maximum area on the basis of the angle-dependent distribution of the light intensity, and a parameter calculation unit calculating the orientation parameter (S) on the basis of a linear relationship determined using the film thickness and refractive index of the sample and the light intensity in the maximum area.