Invention Grant
- Patent Title: Methods and systems to improve pedestal temperature control
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Application No.: US14593873Application Date: 2015-01-09
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Publication No.: US11257693B2Publication Date: 2022-02-22
- Inventor: Son Nguyen , Dmitry Lubomirsky , Chungman Kim , Kirby H. Floyd
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Kilpatrick Townsend & Stockton LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/67
Abstract:
A semiconductor processing system may include a substrate pedestal. The system may also include at least one fluid channel having a delivery portion configured to deliver a temperature controlled fluid to the substrate pedestal, and having a return portion configured to return the temperature controlled fluid from the substrate pedestal. The system may also include a heater coupled with the delivery portion of the at least one fluid channel. The system may also include a temperature measurement device coupled with the return portion of the at least one fluid channel, and the temperature measurement device may be communicatively coupled with the heater.
Public/Granted literature
- US20160204009A1 METHODS AND SYSTEMS TO IMPROVE PEDESTAL TEMPERATURE CONTROL Public/Granted day:2016-07-14
Information query
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