Invention Grant
- Patent Title: Substrate inspection method and substrate inspection apparatus
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Application No.: US16514995Application Date: 2019-07-17
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Publication No.: US11268912B2Publication Date: 2022-03-08
- Inventor: Kazuya Hisano , Akiko Kiyotomi
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JPJP2018-135791 20180719
- Main IPC: G01N21/95
- IPC: G01N21/95 ; H01L21/66 ; H01L21/67

Abstract:
A substrate inspection method includes: acquiring a feature amount of each of divided areas in an inspection target peripheral edge image, the inspection target peripheral edge image being an image of a peripheral portion of a target substrate as an inspection target, the divided areas being obtained by dividing a predetermined area in the image of the peripheral portion of the target substrate into a plurality of areas; and performing a predetermined determination concerning inspection of the peripheral portion of the target substrate based on an acquisition result in the acquiring the feature amount.
Public/Granted literature
- US20200025692A1 SUBSTRATE INSPECTION METHOD AND SUBSTRATE INSPECTION APPARATUS Public/Granted day:2020-01-23
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