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公开(公告)号:US09798251B2
公开(公告)日:2017-10-24
申请号:US14772721
申请日:2014-02-26
Applicant: ASML Netherlands B.V.
Inventor: Raymond Wilhelmus Louis LaFarre , Satish Achanta , Matteo Filippi , Yogesh Karade , Antonius Johannes Maria Nellissen , Ronald Van Der Wilk , Hendrikus Christoffel Maria Van Doremalen , Wilhelmus Jacobus Johannes Welters
CPC classification number: G03F7/70716 , G03F7/70708
Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.
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公开(公告)号:US20210072649A1
公开(公告)日:2021-03-11
申请号:US16952371
申请日:2020-11-19
Applicant: ASML Netherlands B.V.
Inventor: Thomas Poiesz , Bert Dirk Scholten , Dirk Willem Harberts , Lucas Henricus Johannes Stevens , Laura Maria Fernandez Diaz , Johannes Adrianus Cornelis M Pijnenburg , Abraham Alexander Soethoudt , Wilhelmus Jacobus Johannes Welters , Jimmy Matheus Wilhelmus Van De Winkel
IPC: G03F7/20
Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
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公开(公告)号:US11269259B2
公开(公告)日:2022-03-08
申请号:US16952371
申请日:2020-11-19
Applicant: ASML NETHERLANDS B.V.
Inventor: Thomas Poiesz , Bert Dirk Scholten , Dirk Willem Harberts , Lucas Henricus Johannes Stevens , Laura Maria Fernandez Diaz , Johannes Adrianus Cornelis Maria Pijnenburg , Abraham Alexander Soethoudt , Wilhelmus Jacobus Johannes Welters , Jimmy Matheus Wilhelmus Van De Winkel
IPC: G03F7/20
Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
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公开(公告)号:US10976196B2
公开(公告)日:2021-04-13
申请号:US16488259
申请日:2018-02-15
Applicant: ASML NETHERLANDS B.V.
Inventor: Joost André Klugkist , Vadim Yevgenyevich Banine , Johan Franciscus Maria Beckers , Madhusudhanan Jambunathan , Maxim Aleksandrovich Nasalevich , Andrey Nikipelov , Roland Johannes Wilhelmus Stas , David Ferdinand Vles , Wilhelmus Jacobus Johannes Welters , Sandro Wricke
Abstract: A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.
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