公开(公告)号：US09798251B2

公开(公告)日：2017-10-24

申请号：US14772721

申请日：2014-02-26

Applicant: ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis LaFarre ,  Satish Achanta ,  Matteo Filippi ,  Yogesh Karade ,  Antonius Johannes Maria Nellissen ,  Ronald Van Der Wilk ,  Hendrikus Christoffel Maria Van Doremalen ,  Wilhelmus Jacobus Johannes Welters

IPC: G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70708

Abstract: A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body.

公开(公告)号：US20210072649A1

公开(公告)日：2021-03-11

申请号：US16952371

申请日：2020-11-19

Applicant: ASML Netherlands B.V.

Inventor： Thomas Poiesz ,  Bert Dirk Scholten ,  Dirk Willem Harberts ,  Lucas Henricus Johannes Stevens ,  Laura Maria Fernandez Diaz ,  Johannes Adrianus Cornelis M Pijnenburg ,  Abraham Alexander Soethoudt ,  Wilhelmus Jacobus Johannes Welters ,  Jimmy Matheus Wilhelmus Van De Winkel

IPC: G03F7/20

Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US11269259B2

公开(公告)日：2022-03-08

申请号：US16952371

申请日：2020-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas Poiesz ,  Bert Dirk Scholten ,  Dirk Willem Harberts ,  Lucas Henricus Johannes Stevens ,  Laura Maria Fernandez Diaz ,  Johannes Adrianus Cornelis Maria Pijnenburg ,  Abraham Alexander Soethoudt ,  Wilhelmus Jacobus Johannes Welters ,  Jimmy Matheus Wilhelmus Van De Winkel

IPC: G03F7/20

Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US10976196B2

公开(公告)日：2021-04-13

申请号：US16488259

申请日：2018-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Joost André Klugkist ,  Vadim Yevgenyevich Banine ,  Johan Franciscus Maria Beckers ,  Madhusudhanan Jambunathan ,  Maxim Aleksandrovich Nasalevich ,  Andrey Nikipelov ,  Roland Johannes Wilhelmus Stas ,  David Ferdinand Vles ,  Wilhelmus Jacobus Johannes Welters ,  Sandro Wricke

IPC: G01J1/42 ,  G03F7/20

Abstract: A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.