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公开(公告)号：US10534270B2
公开(公告)日：2020-01-14
申请号：US16269745
申请日：2019-02-07
发明人： Norbertus Josephus Martinus Van den Nieuwelaar , Victor Manuel Blanco Carballo , Casper Roderik De Groot , Rolf Hendrikus Jacobus Custers , David Merritt Phillips , Frederik Antonius Van der Zanden , Pieter Lein Joseph Gunter , Erik Henricus Egidius Catharina Eummelen , Yuri Johannes Gabriël Van de Vijver , Bert Dirk Scholten , Marijn Wouters , Ronald Frank Kox , Jorge Alberto Vieyra Salas
摘要： An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.
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公开(公告)号：US11016401B2
公开(公告)日：2021-05-25
申请号：US16610103
申请日：2018-05-01
发明人： Matthew Lipson , Christopher John Mason , Damoon Sohrabibabaheidary , Jimmy Matheus Wilhelmus Van De Winkel , Bert Dirk Scholten
IPC分类号： G03F7/20
摘要： A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.
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公开(公告)号：US20210072649A1
公开(公告)日：2021-03-11
申请号：US16952371
申请日：2020-11-19
发明人： Thomas Poiesz , Bert Dirk Scholten , Dirk Willem Harberts , Lucas Henricus Johannes Stevens , Laura Maria Fernandez Diaz , Johannes Adrianus Cornelis M Pijnenburg , Abraham Alexander Soethoudt , Wilhelmus Jacobus Johannes Welters , Jimmy Matheus Wilhelmus Van De Winkel
IPC分类号： G03F7/20
摘要： A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
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公开(公告)号：US10261422B2
公开(公告)日：2019-04-16
申请号：US15500866
申请日：2015-06-30
发明人： Norbertus Josephus Martinus Van Den Nieuwelaar , Victor Manuel Blanco Carballo , Casper Roderik De Groot , Rolf Hendrikus Jacobus Custers , David Merritt Phillips , Frederik Antonius Van Der Zanden , Pieter Lein Joseph Gunter , Erik Henricus Egidius Catharina Eummelen , Yuri Johannes Gabriël Van De Vijver , Bert Dirk Scholten , Marijn Wouters , Ronald Frank Kox , Jorge Alberto Vieyra Salas
摘要： An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.
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5.发明授权公开(公告)号：US11860552B2
公开(公告)日：2024-01-02
申请号：US16309501
申请日：2017-06-12
发明人： Stef Marten Johan Janssens , Bert Dirk Scholten , Sjoerd Nicolaas Lambertus Donders , Teunis Van Dam , Peter Mark Overschie , Theresa Mary Spaan-Burke , Siegfried Alexander Tromp
IPC分类号： G03F7/00 , H01L21/683 , H01L21/67
CPC分类号： G03F7/70725 , G03F7/707 , G03F7/70783 , G03F7/70816 , H01L21/6838 , H01L21/67288
摘要： A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.
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公开(公告)号：US11269259B2
公开(公告)日：2022-03-08
申请号：US16952371
申请日：2020-11-19
发明人： Thomas Poiesz , Bert Dirk Scholten , Dirk Willem Harberts , Lucas Henricus Johannes Stevens , Laura Maria Fernandez Diaz , Johannes Adrianus Cornelis Maria Pijnenburg , Abraham Alexander Soethoudt , Wilhelmus Jacobus Johannes Welters , Jimmy Matheus Wilhelmus Van De Winkel
IPC分类号： G03F7/20
摘要： A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.
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7.发明授权公开(公告)号：US11664264B2
公开(公告)日：2023-05-30
申请号：US16075754
申请日：2016-12-22
发明人： Andre Bernardus Jeunink , Robby Franciscus Josephus Martens , Youssef Karel Maria De Vos , Ringo Petrus Cornelis Van Dorst , Gerhard Albert Ten Brinke , Dirk Jerome Andre Senden , Coen Hubertus Matheus Baltis , Justin Johannes Hermanus Gerritzen , Jelmer Mattheüs Kamminga , Evelyn Wallis Pacitti , Thomas Poiesz , Arie Cornelis Scheiberlich , Bert Dirk Scholten , André Schreuder , Abraham Alexander Soethoudt , Siegfried Alexander Tromp , Yuri Johannes Gabriël Van De Vijver
IPC分类号： H01L21/683 , H01L21/687 , G03F7/20 , B25B11/00
CPC分类号： H01L21/6838 , B25B11/005 , G03F7/707 , G03F7/70733 , H01L21/68742
摘要： A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.
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公开(公告)号：US11579533B2
公开(公告)日：2023-02-14
申请号：US17151291
申请日：2021-01-18
发明人： Günes Nakiboglu , Coen Hubertus Matheus Baltis , Siegfried Alexander Tromp , Yuri Johannes Gabriël Van De Vijver , Bert Dirk Scholten , Daan Daniel Johannes Antonius Van Sommeren , Mark Johannes Hermanus Frencken
IPC分类号： G03F7/20 , H01L21/027 , H01L21/687
摘要： A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.
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公开(公告)号：US10895808B2
公开(公告)日：2021-01-19
申请号：US15779804
申请日：2016-11-02
发明人： Günes Nakiboglu , Coen Hubertus Matheus Baltis , Siegfried Alexander Tromp , Yuri Johannes Gabriël Van De Vijver , Bert Dirk Scholten , Daan Daniel Johannes Antonius Van Sommeren , Mark Johannes Hermanus Frencken
IPC分类号： G03F7/20 , H01L21/027 , H01L21/687
摘要： A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.
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