- 专利标题： Processing of semiconductors using vaporized solvents
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申请号： US16208003申请日： 2018-12-03
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公开(公告)号： US11289323B2公开(公告)日： 2022-03-29
- 发明人: Shuang Meng , Shawming Ma , Michael X. Yang
- 申请人： Mattson Technology, Inc. , Beijing E-Town Semiconductor Technology, Co., LTD
- 申请人地址： US CA Fremont; CN Beijing
- 专利权人： Mattson Technology, Inc.,Beijing E-Town Semiconductor Technology, Co., LTD
- 当前专利权人： Mattson Technology, Inc.,Beijing E-Town Semiconductor Technology, Co., LTD
- 当前专利权人地址： US CA Fremont; CN Beijing
- 代理机构： Dority and Manning, P.A.
- 主分类号： H01L21/02
- IPC分类号： H01L21/02 ; H01L21/67 ; H01J37/32
摘要：
Processes and apparatuses for the treatment of semiconductor workpieces are provided. In some embodiments, a method can include placing the workpiece into a process chamber; vaporizing a solvent to create a vaporized solvent; introducing the vaporized solvent into the process chamber; and exposing the workpiece to the vaporized solvent.
公开/授权文献
- US20190189479A1 Processing of Semiconductors Using Vaporized Solvents 公开/授权日：2019-06-20
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