Invention Grant
- Patent Title: Stage and plasma processing apparatus
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Application No.: US16402381Application Date: 2019-05-03
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Publication No.: US11289356B2Publication Date: 2022-03-29
- Inventor: Daisuke Hayashi
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Abelman, Frayne & Schwab
- Priority: JPJP2018-091438 20180510
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01J37/32 ; H01L21/687

Abstract:
Disclosed is a stage including: an electrostatic chuck having a substrate placement surface on which a substrate is placed; and an electrostatic chuck placement plate on which the electrostatic chuck is placed. The electrostatic chuck and the electrostatic chuck placement plate are fastened by a plurality of first fasteners from a side of the electrostatic chuck placement plate, and the stage is fastened to a support provided on an opposite side of the electrostatic chuck of the electrostatic chuck placement plate by a plurality of second fasteners on a radially outer side of the placement surface.
Public/Granted literature
- US11232967B2 Stage and plasma processing apparatus Public/Granted day:2022-01-25
Information query
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