Invention Grant
- Patent Title: Method and system for mixed mode wafer inspection
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Application No.: US16206691Application Date: 2018-11-30
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Publication No.: US11295438B2Publication Date: 2022-04-05
- Inventor: Jason Z. Lin , Allen Park , Ellis Chang , Richard Wallingford , Songnian Rong , Chetana Bhaskar
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G06T7/00
- IPC: G06T7/00

Abstract:
Mixed-mode includes receiving inspection results including one or more images of a selected region of the wafer, the one or more images include one or more wafer die including a set of repeating blocks, the set of repeating blocks a set of repeating cells. In addition, mixed-mode inspection includes adjusting a pixel size of the one or more images to map each cell, block and die to an integer number of pixels. Further, mixed-mode inspection includes comparing a first wafer die to a second wafer die to identify an occurrence of one or more defects in the first or second wafer die, comparing a first block to a second block to identify an occurrence of one or more defects in the first or second blocks and comparing a first cell to a second cell to identify an occurrence of one or more defects in the first or second cells.
Public/Granted literature
- US20190108630A1 Method and System for Mixed Mode Wafer Inspection Public/Granted day:2019-04-11
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