Invention Grant
- Patent Title: Electron beam inspection apparatus stage positioning
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Application No.: US16809519Application Date: 2020-03-04
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Publication No.: US11302512B2Publication Date: 2022-04-12
- Inventor: Marcel Koenraad Marie Baggen , Antonius Henricus Arends , Lucas Kuindersma , Johannes Hubertus Antonius Van De Rijdt , Peter Paul Hempenius , Robertus Jacobus Theodorus Van Kempen , Niels Johannes Maria Bosch , Henricus Martinus Johannes Van De Groes , Kuo-Feng Tseng , Hans Butler , Michael Johannes Christiaan Ronde
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: EP17189213 20170904
- Main IPC: H01J37/20
- IPC: H01J37/20

Abstract:
An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.
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