公开(公告)号：US11815473B2

公开(公告)日：2023-11-14

申请号：US16812109

申请日：2020-03-06

Applicant: ASML Netherlands B.V.

Inventor： Kuo-Feng Tseng ,  Zhonghua Dong ,  Yixiang Wang ,  Zhong-wei Chen

IPC: G01N23/203 ,  G01N23/2252 ,  G01N23/2254 ,  G01N23/2276

CPC classification number: G01N23/203 ,  G01N23/2252 ,  G01N23/2254 ,  G01N23/2276 ,  G01N2223/309 ,  G01N2223/33

Abstract: Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance in a first direction; wherein the optical system is configured to form probe spots on the sample with the charged particles; wherein the optical system is configured to move the probe spots by the first distance in the first direction and by a second distance in a second direction, simultaneously, while the stage moves the sample by the first distance in the first direction; wherein the optical system is configured to move the probe spots by the first distance less a width of one of the probe spots in an opposite direction of the first direction, after the stage moves the sample by the first distance in the first direction.

公开(公告)号：US11302512B2

公开(公告)日：2022-04-12

申请号：US16809519

申请日：2020-03-04

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie Baggen ,  Antonius Henricus Arends ,  Lucas Kuindersma ,  Johannes Hubertus Antonius Van De Rijdt ,  Peter Paul Hempenius ,  Robertus Jacobus Theodorus Van Kempen ,  Niels Johannes Maria Bosch ,  Henricus Martinus Johannes Van De Groes ,  Kuo-Feng Tseng ,  Hans Butler ,  Michael Johannes Christiaan Ronde

IPC: H01J37/20

Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.