公开(公告)号：US11302512B2

公开(公告)日：2022-04-12

申请号：US16809519

申请日：2020-03-04

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie Baggen ,  Antonius Henricus Arends ,  Lucas Kuindersma ,  Johannes Hubertus Antonius Van De Rijdt ,  Peter Paul Hempenius ,  Robertus Jacobus Theodorus Van Kempen ,  Niels Johannes Maria Bosch ,  Henricus Martinus Johannes Van De Groes ,  Kuo-Feng Tseng ,  Hans Butler ,  Michael Johannes Christiaan Ronde

IPC: H01J37/20

Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.