Invention Grant
- Patent Title: Electronic apparatus and manufacturing method thereof
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Application No.: US16920448Application Date: 2020-07-03
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Publication No.: US11302635B2Publication Date: 2022-04-12
- Inventor: Tang Chin Hung , Chin-Lung Ting , Chung-Kuang Wei , Ker-Yih Kao , Tong-Jung Wang , Chih-Yung Hsieh , Hao Jung Huang , I-Yin Li , Chia-Chi Ho , Yi Hung Lin , Cheng-Hsu Chou , Chia-Ping Tseng
- Applicant: Innolux Corporation
- Applicant Address: TW Miao-Li County
- Assignee: Innolux Corporation
- Current Assignee: Innolux Corporation
- Current Assignee Address: TW Miao-Li County
- Agency: JCIPRNET
- Priority: CN202010411348.5 20200515
- Main IPC: H01L23/528
- IPC: H01L23/528 ; H01L27/06 ; H01L23/522 ; H01L21/8234 ; H01L29/93 ; H01L23/538 ; H01L21/60

Abstract:
The disclosure provides an electronic apparatus and a manufacturing method thereof. The electronic apparatus includes a first insulating layer, a first metal layer, a second metal layer, and an electronic assembly. The first insulating layer includes a first surface and a second surface opposite to the first surface. The first metal layer has an opening and is formed on the first surface. The second metal layer is formed on the second surface and a projection of the opening on the second surface is overlapped with a projection of the second metal layer on the second surface. The electronic assembly is electrically connected with the first metal layer and the second metal layer.
Public/Granted literature
- US20210035909A1 ELECTRONIC APPARATUS AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-02-04
Information query
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