Invention Grant
- Patent Title: SiC single crystal manufacturing apparatus and SiC single crystal manufacturing method
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Application No.: US16681328Application Date: 2019-11-12
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Publication No.: US11306412B2Publication Date: 2022-04-19
- Inventor: Yohei Fujikawa
- Applicant: SHOWA DENKO K.K.
- Applicant Address: JP Tokyo
- Assignee: SHOWA DENKO K.K.
- Current Assignee: SHOWA DENKO K.K.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JPJP2018-213902 20181114
- Main IPC: C30B35/00
- IPC: C30B35/00 ; C30B29/36

Abstract:
A SiC single crystal manufacturing apparatus of the present invention is a SiC single crystal manufacturing apparatus that manufactures a SiC single crystal by performing crystal growth on a growth surface of a seed crystal disposed inside a crucible, and the crucible 1 is able to accommodate a raw material M for a SiC single crystal therein, and includes a crucible lower portion 1A and a crucible upper portion 1B, the crucible lower portion including a bottom portion 1Aa and a side portion 1Ab, and the crucible upper portion including a top portion 1Ba provided with a seed crystal installation portion 1Bc for installing a seed crystal SD and a side portion 1Bb. A male thread 1AAa is provided at an outer circumference 1AA of the side portion 1Ab of the crucible lower portion 1A, a female thread 1BBa engaging with the male thread is provided at an inner circumference 1BB of the side portion 1Bb of the crucible upper portion 1B, and the crucible includes a rotation mechanism 10 that is configured to relatively move the crucible upper portion 1B and the crucible lower portion 1A in a vertical direction by rotating at least one of the crucible upper portion 1B and the crucible lower portion 1A.
Public/Granted literature
- US20200149190A1 SiC SINGLE CRYSTAL MANUFACTURING APPARATUS AND SiC SINGLE CRYSTAL MANUFACTURING METHOD Public/Granted day:2020-05-14
Information query
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