Invention Grant
- Patent Title: Methods and systems employing look-around and look-ahead inversion of downhole measurements
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Application No.: US16099980Application Date: 2017-05-08
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Publication No.: US11306582B2Publication Date: 2022-04-19
- Inventor: Michael Thiel , Dzevat Omeragic , Andrei Davydychev , Tarek M. Habashy
- Applicant: SCHLUMBERGER TECHNOLOGY CORPORATION
- Applicant Address: US TX Sugar Land
- Assignee: SCHLUMBERGER TECHNOLOGY CORPORATION
- Current Assignee: SCHLUMBERGER TECHNOLOGY CORPORATION
- Current Assignee Address: US TX Sugar Land
- Agent Trevor G. Grove
- International Application: PCT/US2017/031490 WO 20170508
- International Announcement: WO2017/196696 WO 20171116
- Main IPC: G01V3/26
- IPC: G01V3/26 ; G01V3/38 ; E21B47/125 ; G01V3/30

Abstract:
Inversion-based workflows are provided for real-time interpretation of the electromagnetic (EM) look-around and look-ahead measurements. The profile of a look-around zone is determined by interpreting EM measurements of a look-around zone. The profile of the look-around zone characterizes formation dip as well as vertical resistivity or resistivity anisotropy of one or more formation layers of the look-around zone. The profile of a look-ahead zone is determined by interpreting EM measurements of the look-ahead zone. The profile of the look-ahead zone characterizes formation dip as well as horizontal resistivity, vertical resistivity or anisotropy of one or more formation layers of the look-ahead zone. The workflows can also involve interpretation of look-around resistivity measurements to aid in the characterization of the look-around zone.
Public/Granted literature
- US20190128116A1 METHODS AND SYSTEMS EMPLOYING LOOK-AROUND AND LOOK-AHEAD INVERSION OF DOWNHOLE MEASUREMENTS Public/Granted day:2019-05-02
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