- 专利标题: Gain cell embedded DRAM in fully depleted silicon-on-insulator technology
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申请号: US17257893申请日: 2019-07-09
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公开(公告)号: US11309008B2公开(公告)日: 2022-04-19
- 发明人: Robert Giterman , Adam Teman
- 申请人: Bar-Ilan University
- 申请人地址: IL Ramat-Gan
- 专利权人: Bar-Ilan University
- 当前专利权人: Bar-Ilan University
- 当前专利权人地址: IL Ramat-Gan
- 国际申请: PCT/IL2019/050764 WO 20190709
- 国际公布: WO2020/012470 WO 20200116
- 主分类号: G11C11/34
- IPC分类号: G11C11/34 ; G11C11/404 ; G11C11/4091 ; G11C11/4096
摘要:
An FD-SOI GC-edRAM gain cell includes: a write bit line terminal connected to a WBL; a read bit line terminal connected to a RBL; a write trigger terminal connected to a WWL, for inputting a write trigger signal; a read trigger terminal put connected to a RWL, for inputting a read trigger signal; at least one body voltage terminal connected to a respective body voltage; and multiple FD-SOI transistors. The FD-SOI transistors are interconnected to form a storage node for retaining a data signal. The bodies of at least two of the transistors are coupled in a single well to a body voltage terminal. The write trigger signal triggers writing an input data signal from the write bit line terminal to the storage node and the read trigger signal triggers outputting the retained data signal from the storage node to the read bit line terminal.
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