Invention Grant
- Patent Title: Chip structure and manufacturing method thereof
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Application No.: US16941486Application Date: 2020-07-28
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Publication No.: US11309271B2Publication Date: 2022-04-19
- Inventor: Jiun-Yen Lai , Chia-Hsiang Chen
- Applicant: XINTEC INC.
- Applicant Address: TW Taoyuan
- Assignee: XINTEC INC.
- Current Assignee: XINTEC INC.
- Current Assignee Address: TW Taoyuan
- Agency: Liu & Liu
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/48

Abstract:
A chip structure includes a first substrate, a second substrate, a conductive via, and a redistribution layer. The first substrate has a first inclined sidewall. The second substrate is located on a bottom surface of the first substrate, and has an upper portion and a lower portion. The lower portion extends from the upper portion. The upper portion is between the first substrate and the lower portion. The upper portion has a second inclined sidewall, and a slope of the first inclined sidewall is substantially equal to a slope of the second inclined sidewall. The conductive via is in the lower portion. The redistribution layer extends from a top surface of the first substrate to a top surface of the lower portion of the second substrate sequentially along the first inclined sidewall and the second inclined sidewall, and is electrically connected to the conductive via.
Public/Granted literature
- US20210035940A1 CHIP STRUCTURE AND MANUFACTURING METHOD THEREOF Public/Granted day:2021-02-04
Information query
IPC分类: