Invention Grant
- Patent Title: Nitride semiconductor device
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Application No.: US16776010Application Date: 2020-01-29
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Publication No.: US11316013B2Publication Date: 2022-04-26
- Inventor: Katsunori Ueno
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kawasaki
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kawasaki
- Priority: JPJP2019-118277 20190626
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/08 ; H01L29/78 ; H01L29/417

Abstract:
A nitride semiconductor device includes a nitride semiconductor layer, channel cells in the nitride semiconductor layer, a source lead region of a second conductivity type in the nitride semiconductor layer, and a source electrode on a side where a first main surface of the nitride semiconductor layer is located. The channel cells each include a well region of a first conductivity type and a source region of the second conductivity type in contact with the well region. The source lead region is connected to the source region. The channel cells extend in a first direction in a planar view from a normal direction of the first main surface, and arranged in a second direction intersecting with the first direction in the planar view. The source electrode is in contact with the source lead region away from a line of the channel cells arranged in the second direction.
Information query
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