Invention Grant
- Patent Title: HEMT transistor with adjusted gate-source distance, and manufacturing method thereof
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Application No.: US16688974Application Date: 2019-11-19
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Publication No.: US11316038B2Publication Date: 2022-04-26
- Inventor: Ferdinando Iucolano
- Applicant: STMICROELECTRONICS S.R.L.
- Applicant Address: IT Agrate Brianza
- Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee: STMICROELECTRONICS S.R.L.
- Current Assignee Address: IT Agrate Brianza
- Agency: Seed IP Law Group LLP
- Priority: IT102018000010448 20181120
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/40 ; H01L29/66 ; H01L29/78

Abstract:
An HEMT includes: a heterostructure; a dielectric layer on the heterostructure; a gate electrode, which extends throughout the thickness of the dielectric layer; a source electrode; and a drain electrode. The dielectric layer extends between the gate electrode and the drain electrode and is absent between the gate electrode and the source electrode. In this way, the distance between the gate electrode and the source electrode can be designed in the absence of constraints due to a field plate that extends towards the source electrode.
Public/Granted literature
- US20200161462A1 HEMT TRANSISTOR WITH ADJUSTED GATE-SOURCE DISTANCE, AND MANUFACTURING METHOD THEREOF Public/Granted day:2020-05-21
Information query
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