Invention Grant
- Patent Title: Complementary metal-oxide-semiconductor device and method of manufacturing the same
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Application No.: US16801071Application Date: 2020-02-25
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Publication No.: US11322495B2Publication Date: 2022-05-03
- Inventor: Georgios Vellianitis
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: JCIPRNET
- Main IPC: H01L27/092
- IPC: H01L27/092 ; H01L29/06 ; H01L21/8234 ; H01L21/8238

Abstract:
A complementary metal-oxide-semiconductor device includes a p-type field effect transistor and an n-type filed effect transistor. The p-type filed effect transistor has a first transistor architecture. The n-type field effect transistor is coupled with the p-type field effect transistor and has a second transistor architecture. The second transistor architecture is different from the first transistor architecture. The p-type field effect transistor and the n-type field effect transistor share a same gate structure.
Public/Granted literature
- US20210125986A1 COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2021-04-29
Information query
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