Invention Grant
- Patent Title: Method and apparatus for determining a radiation beam intensity profile
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Application No.: US16556603Application Date: 2019-08-30
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Publication No.: US11353796B2Publication Date: 2022-06-07
- Inventor: Teis Johan Coenen , Han-Kwang Nienhuys , Sandy Claudia Scholz , Sander Bas Roobol
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP18196626 20180925
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G21K1/06 ; G01T1/29

Abstract:
Methods and apparatus for determining an intensity profile of a radiation beam. The method comprises providing a diffraction structure, causing a relative movement of the diffraction structure relative to the radiation beam from a first position, wherein the radiation beam does not irradiate the diffraction structure to a second position, wherein the radiation beam irradiates the diffraction structure, measuring, with a radiation detector, diffracted radiation signals produced from a diffraction of the radiation beam by the diffraction structure as the diffraction structure transitions from the first position to the second position or vice versa, and determining an intensity profile of the radiation beam based on the measured diffracted radiation signals.
Public/Granted literature
- US20200098486A1 Method and Apparatus for Determining a Radiation Beam Intensity Profile Public/Granted day:2020-03-26
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