公开(公告)号：US11353796B2

公开(公告)日：2022-06-07

申请号：US16556603

申请日：2019-08-30

Applicant: ASML Netherlands B.V.

Inventor： Teis Johan Coenen ,  Han-Kwang Nienhuys ,  Sandy Claudia Scholz ,  Sander Bas Roobol

IPC: G03F7/20 ,  G21K1/06 ,  G01T1/29

Abstract: Methods and apparatus for determining an intensity profile of a radiation beam. The method comprises providing a diffraction structure, causing a relative movement of the diffraction structure relative to the radiation beam from a first position, wherein the radiation beam does not irradiate the diffraction structure to a second position, wherein the radiation beam irradiates the diffraction structure, measuring, with a radiation detector, diffracted radiation signals produced from a diffraction of the radiation beam by the diffraction structure as the diffraction structure transitions from the first position to the second position or vice versa, and determining an intensity profile of the radiation beam based on the measured diffracted radiation signals.