Invention Grant
- Patent Title: Method for producing graphene nanospheres
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Application No.: US16639805Application Date: 2018-08-16
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Publication No.: US11365123B2Publication Date: 2022-06-21
- Inventor: Soon Mok Choi , Byeong-Geun Kim
- Applicant: KOREA UNIVERSITY OF TECHNOLOGY AND EDUCATION INDUSTRY-UNIVERSITY COOPERATION FOUNDATION
- Applicant Address: KR Cheonan-si
- Assignee: KOREA UNIVERSITY OF TECHNOLOGY AND EDUCATION INDUSTRY-UNIVERSITY COOPERATION FOUNDATION
- Current Assignee: KOREA UNIVERSITY OF TECHNOLOGY AND EDUCATION INDUSTRY-UNIVERSITY COOPERATION FOUNDATION
- Current Assignee Address: KR Cheonan-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2017-0104852 20170818
- International Application: PCT/KR2018/009402 WO 20180816
- International Announcement: WO2019/035663 WO 20190221
- Main IPC: C01B32/186
- IPC: C01B32/186 ; C23C16/26
Abstract:
The present invention provides a method of manufacturing a graphene nanosphere through a single process that is simplified in order to enable mass production. The method includes step 1 of manufacturing a silicon carbide nanosphere coated with graphene through chemical vapor deposition (CVD) using a gas containing a silicon source and a carbon source and step 2 of discontinuing the chemical vapor deposition (CVD) and then performing cooling.
Public/Granted literature
- US20200247677A1 METHOD FOR PRODUCING GRAPHENE NANOSPHERES Public/Granted day:2020-08-06
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