Invention Grant
- Patent Title: Method and apparatus for configuring spatial dimensions of a beam during a scan
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Application No.: US17268177Application Date: 2019-08-01
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Publication No.: US11366396B2Publication Date: 2022-06-21
- Inventor: Daan Maurits Slotboom , Hermannes Theodorus Heijmerikx , Javier Augusto Loaiza Rivas , Jeroen Cottaar
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP18192251 20180903,EP19150960 20190109
- International Application: PCT/EP2019/070748 WO 20190801
- International Announcement: WO2020/048693 WO 20200312
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method of configuring a step of scanning a beam of photons or particles across a patterning device for exposing a pattern onto a substrate, wherein the method includes determining a spatial resolution of a patterning correction configured to improve quality of the exposing, and determining a spatial dimension of the beam based on the determined spatial resolution of the patterning correction.
Public/Granted literature
- US20210302843A1 METHOD AND APPARATUS FOR CONFIGURING SPATIAL DIMENSIONS OF A BEAM DURING A SCAN Public/Granted day:2021-09-30
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