Invention Grant
- Patent Title: Method of forming an aluminum oxide layer, metal surface with aluminum oxide layer, and electronic device
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Application No.: US16012341Application Date: 2018-06-19
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Publication No.: US11424201B2Publication Date: 2022-08-23
- Inventor: Michael Rogalli , Johann Gatterbauer , Wolfgang Lehnert , Kurt Matoy , Evelyn Napetschnig , Manfred Schneegans , Bernhard Weidgans
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE102017113515.4 20170620
- Main IPC: H01L23/00
- IPC: H01L23/00

Abstract:
A method of forming an aluminum oxide layer is provided. The method includes providing a metal surface including at least one metal of a group of metals, the group of metals consisting of copper, aluminum, palladium, nickel, silver, and alloys thereof. The method further includes depositing an aluminum oxide layer on the metal surface by atomic layer deposition, wherein a maximum processing temperature during the depositing is 280° C., such that the aluminum oxide layer is formed with a surface having a liquid solder contact angle of less than 40°.
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