Invention Grant
- Patent Title: Method for selectively removing nickel platinum material
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Application No.: US16444262Application Date: 2019-06-18
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Publication No.: US11441229B2Publication Date: 2022-09-13
- Inventor: SeongJin Hong
- Applicant: ENTEGRIS, INC.
- Applicant Address: US MA Billerica
- Assignee: ENTEGRIS, INC.
- Current Assignee: ENTEGRIS, INC.
- Current Assignee Address: US MA Billerica
- Main IPC: C23F1/30
- IPC: C23F1/30 ; H01L21/4757 ; H01L21/306 ; H01L21/3213
Abstract:
A method of selectively removing NiPt material from a microelectronic substrate, the method comprising contacting the NiPt material with an aqueous etching composition comprising: an oxidising agent; a strong acid; and a source of chloride.
Public/Granted literature
- US20200010959A1 METHOD FOR SELECTIVELY REMOVING NICKEL PLATINUM MATERIAL Public/Granted day:2020-01-09
Information query
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