Invention Grant
- Patent Title: Method for producing microlens and plasma processing apparatus
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Application No.: US16644333Application Date: 2019-06-07
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Publication No.: US11454744B2Publication Date: 2022-09-27
- Inventor: Yoshinari Hatazaki , Takashi Shinyama
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer; Tanya E. Harkins
- Priority: JPJP2018-117927 20180621
- International Application: PCT/JP2019/022782 WO 20190607
- International Announcement: WO2019/244677 WO 20191226
- Main IPC: G02B3/00
- IPC: G02B3/00 ; B29D11/00 ; H01L21/3065 ; H05H1/46

Abstract:
A method for producing a microlens according to the present invention includes an etching step and a surface treatment step. In the etching step, a target object which is obtained by forming a second organic film having a lens shape on a first organic film that is formed on a substrate is subjected to etching that uses a plasma of a first processing gas, while using the second organic film as a mask, so that the first organic film is etched so as to transfer the lens shape of the second organic film to the first organic film, thereby forming a microlens in the first organic film. In the surface treatment step, a surface treatment is performed so as to smooth the surface of the microlens that is formed in the first organic film.
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