Invention Grant
- Patent Title: Ceramic structure for plasma processing apparatus and manufacturing method thereof
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Application No.: US16892427Application Date: 2020-06-04
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Publication No.: US11456158B2Publication Date: 2022-09-27
- Inventor: Joo Hwan Kim
- Applicant: KSM COMPONENT CO., LTD.
- Applicant Address: KR Gimpo-si
- Assignee: KSM COMPONENT CO., LTD.
- Current Assignee: KSM COMPONENT CO., LTD.
- Current Assignee Address: KR Gimpo-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2019-0066926 20190605
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01J9/30 ; C04B35/645 ; H01J9/36

Abstract:
A ceramic structure including a first conductive structure embedded therein and a second conductive structure embedded at a different depth from the first conductive structure is disclosed. In the ceramic structure, the first conductive structure and the second conductive structure are electrically connected to each other by an electrically conductive connection member capable of compensating for a vertical shrinkage rate of a ceramic sheet shape while being embedded therein when sintering the ceramic structure.
Public/Granted literature
- US1895072A Continuous furnace for metallurgical purposes Public/Granted day:1933-01-24
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