- 专利标题： Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device
-
申请号： US16805922申请日： 2020-03-02
-
公开(公告)号： US11467489B2公开(公告)日： 2022-10-11
- 发明人: Kazunari Yagi , Takashi Kawashima , Tomotaka Tsuchimura
- 申请人： FUJIFILM Corporation
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JPJP2017-180109 20170920
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/11 ; G03F7/20
摘要：
An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid upon irradiation with actinic rays or radiation and a resin whose polarity increases by the action of an acid, in which the compound is represented by a specific General Formula (X).
信息查询
IPC分类:
