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公开(公告)号：US12001140B2
公开(公告)日：2024-06-04
申请号：US17169757
申请日：2021-02-08
申请人： FUJIFILM Corporation
IPC分类号： G03F7/039 , C08F212/14 , C08F220/18 , C08F220/58 , G03F7/038
CPC分类号： G03F7/039 , C08F212/24 , C08F220/1806 , C08F220/585 , G03F7/038
摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases by the action of an acid; and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin has a repeating unit represented by General Formula (B-1).
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公开(公告)号：US11467489B2
公开(公告)日：2022-10-11
申请号：US16805922
申请日：2020-03-02
申请人： FUJIFILM Corporation
摘要： An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid upon irradiation with actinic rays or radiation and a resin whose polarity increases by the action of an acid, in which the compound is represented by a specific General Formula (X).
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公开(公告)号：US20210216012A1
公开(公告)日：2021-07-15
申请号：US17212546
申请日：2021-03-25
申请人： FUJIFILM Corporation
IPC分类号： G03F7/004 , C08F220/18 , C08F220/28 , C08F212/14 , C08F220/36 , G03F7/039 , C09D125/18 , C09D133/10 , C09D133/16
摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes an acid-decomposable resin having a repeating unit represented by General Formula (I), and a compound that generates an add upon irradiation with actinic rays or radiation.
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公开(公告)号：US09958576B2
公开(公告)日：2018-05-01
申请号：US15389546
申请日：2016-12-23
申请人： FUJIFILM Corporation
发明人： Takashi Kawashima , Keisuke Arimura
CPC分类号： G02B1/04 , C08K5/56 , G02B5/208 , G02B5/22 , H01L27/14618 , H01L27/14625 , H04N5/2257 , H04N5/238 , C08L25/06 , C08L33/26 , C08L33/08 , C08L33/10
摘要： Provided are a near infrared ray absorbent composition which can form a cured film having excellent heat resistance while maintaining high near infrared ray shielding properties, and a near infrared ray cut filter, a manufacturing method of a near infrared ray cut filter, a solid image pickup element, and a camera module using the near infrared ray absorbent composition. The near infrared ray absorbent composition contains a compound having a partial structure represented by M-X, and a near infrared ray absorbent compound, and a content of the compound having a partial structure represented by M-X is greater than or equal to 15 mass % with respect to a total solid content of the near infrared ray absorbent composition. Here, M is an atom selected from Si, Ti, Zr, and Al, X is one type selected from a hydroxy group, an alkoxy group, an acyloxy group, a phosphoryloxy group, a sulfonyloxy group, an amino group, an oxime group, and O═C(Ra)(Rb), Ra and Rb each independently represent a monovalent organic group, and in a case in which X is O═C(Ra)(Rb), X is bonded to M by an unshared electron pair of an oxygen atom of a carbonyl group.
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公开(公告)号：US09826129B2
公开(公告)日：2017-11-21
申请号：US14876287
申请日：2015-10-06
申请人： FUJIFILM CORPORATION
IPC分类号： H04N5/225 , C07F9/30 , C07F7/18 , C07F9/40 , G02B5/20 , C07F9/12 , C07F9/09 , C07F9/143 , C07F9/58 , C07F1/08 , C07F9/06 , C09B57/10 , G02B5/22 , H04N5/33
CPC分类号： H04N5/2254 , C07F1/08 , C07F7/1804 , C07F9/06 , C07F9/098 , C07F9/12 , C07F9/143 , C07F9/304 , C07F9/4021 , C07F9/58 , C09B57/10 , G02B5/208 , G02B5/22 , H04N5/2257 , H04N5/33
摘要： Provided are a near-infrared-ray-absorbing composition having strong near-infrared shielding properties when a cured film is produced, a near-infrared-ray cut filter, a manufacturing method therefor, a camera module, and a manufacturing method therefor. The near-infrared-ray-absorbing composition includes a copper complex obtained by reacting a compound (A) having at least two coordination sites with a copper component.
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公开(公告)号：US12038689B2
公开(公告)日：2024-07-16
申请号：US17212546
申请日：2021-03-25
申请人： FUJIFILM Corporation
IPC分类号： G03F7/039 , C08F212/14 , C08F220/18 , C08F220/28 , C08F220/36 , C09D125/18 , C09D133/10 , C09D133/16 , G03F7/004 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0392 , C08F212/22 , C08F220/1808 , C08F220/1809 , C08F220/1812 , C08F220/1818 , C08F220/281 , C08F220/282 , C08F220/283 , C08F220/365 , C09D125/18 , C09D133/10 , C09D133/16 , G03F7/0045 , G03F7/039 , G03F7/0397 , G03F7/30 , G03F7/38
摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes an acid-decomposable resin having a repeating unit represented by General Formula (1), and a compound that generates an acid upon irradiation with actinic rays or radiation.
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公开(公告)号：US11953829B2
公开(公告)日：2024-04-09
申请号：US16797035
申请日：2020-02-21
申请人： FUJIFILM Corporation
发明人： Kazunari Yagi , Takashi Kawashima , Tomotaka Tsuchimura , Hajime Furutani , Michihiro Shirakawa
IPC分类号： G03F7/004 , C08F212/14 , C08F220/28 , G03F7/038 , G03F7/039 , G03F7/16 , G03F7/20 , G03F7/32 , G03F7/38
CPC分类号： G03F7/0045 , C08F212/24 , C08F220/282 , G03F7/0046 , G03F7/038 , G03F7/039 , G03F7/168 , G03F7/2004 , G03F7/322 , G03F7/38
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a repeating unit having a group in which a phenolic hydroxyl group is protected with an acid-leaving group; a first photoacid generator that generates an acid having a pKa of −2.00 to 2.00, in which in a case where the acid thus generated is a carboxylic acid, a pKa of the carboxylic acid is −2.00 or more and less than 1.00; and a second photoacid generator that generates a carboxylic acid having a pKa of 1.00 or more.
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公开(公告)号：US11604412B2
公开(公告)日：2023-03-14
申请号：US16722026
申请日：2019-12-20
申请人： FUJIFILM Corporation
IPC分类号： G03F7/039 , G03F7/004 , C08F212/14 , G03F7/20 , G03F7/30
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a group represented by General Formula (1) and a compound that generates an acid upon irradiation with actinic rays or radiation.
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公开(公告)号：US20210109446A1
公开(公告)日：2021-04-15
申请号：US17130054
申请日：2020-12-22
申请人： FUJIFILM Corporation
IPC分类号： G03F7/039 , G03F7/038 , C08F220/18 , C08F216/36 , C08F220/28
摘要： The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition in which fewer defects are generated in any development treatment of alkali development and organic solvent development, a pattern forming method, a method for manufacturing an electronic device, and a resin. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a repeating unit represented by Formula (1) and a repeating unit having an acid-decomposable group, and a photoacid generator.
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公开(公告)号：US10928726B2
公开(公告)日：2021-02-23
申请号：US16299666
申请日：2019-03-12
申请人： FUJIFILM Corporation
IPC分类号： G03F7/00 , C09D17/00 , C09D4/06 , C09D7/45 , C09D133/06 , C08K3/22 , G03F7/105 , G03F7/07 , C08L101/02 , G03F7/004 , G03F7/075 , G03F7/027
摘要： Provided are a dispersion liquid and a composition which have excellent particle dispersibility and make it possible to manufacture a film having a high color valency. Also provided are a film, a manufacturing method of a film, and a dispersant. The dispersion liquid contains particles, a solvent, and a dispersant. The dispersant has a particle adsorption portion and a solvophilic portion, and the solvophilic portion includes a moiety which is decomposed or denatured by an external stimulus.
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