公开(公告)号：US12001140B2

公开(公告)日：2024-06-04

申请号：US17169757

申请日：2021-02-08

Applicant: FUJIFILM Corporation

Inventor： Kazunari Yagi ,  Akihiro Kaneko ,  Takashi Kawashima ,  Akiyoshi Goto

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  C08F220/58 ,  G03F7/038

CPC classification number: G03F7/039 ,  C08F212/24 ,  C08F220/1806 ,  C08F220/585 ,  G03F7/038

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases by the action of an acid; and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin has a repeating unit represented by General Formula (B-1).

公开(公告)号：US11467489B2

公开(公告)日：2022-10-11

申请号：US16805922

申请日：2020-03-02

Applicant: FUJIFILM Corporation

Inventor： Kazunari Yagi ,  Takashi Kawashima ,  Tomotaka Tsuchimura

IPC: G03F7/004 ,  G03F7/11 ,  G03F7/20

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid upon irradiation with actinic rays or radiation and a resin whose polarity increases by the action of an acid, in which the compound is represented by a specific General Formula (X).

公开(公告)号：US20210216012A1

公开(公告)日：2021-07-15

申请号：US17212546

申请日：2021-03-25

Applicant: FUJIFILM Corporation

Inventor： Akihiro KANEKO ,  Kazunari Yagi ,  Takashi Kawashima ,  Akiyoshi Goto

IPC: G03F7/004 ,  C08F220/18 ,  C08F220/28 ,  C08F212/14 ,  C08F220/36 ,  G03F7/039 ,  C09D125/18 ,  C09D133/10 ,  C09D133/16

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes an acid-decomposable resin having a repeating unit represented by General Formula (I), and a compound that generates an add upon irradiation with actinic rays or radiation.

公开(公告)号：US10351526B2

公开(公告)日：2019-07-16

申请号：US15259139

申请日：2016-09-08

Applicant: FUJIFILM Corporation

Inventor： Yasuhiro Ishiwata ,  Kazunari Yagi ,  Akinori Fujita ,  Koutaro Okabe

IPC: G02B5/20 ,  G03F7/004 ,  C07D209/14 ,  G03F7/00 ,  G03F7/027 ,  G03F7/033 ,  G03F7/105 ,  C09B11/12 ,  C09B69/10 ,  G02B5/22 ,  C07C211/58 ,  C07C217/76 ,  C07C229/36 ,  C07C229/48 ,  C07C317/32 ,  G03F7/20 ,  G03F7/32

Abstract: The present invention provides a colored curable resin composition that exhibits good heat resistance and durability in a sputtering process, a cured film, a color filter, a method for manufacturing a color filter, a solid-state image device, an image display device, a compound, and a cation. The colored curable resin composition contains a colorant represented by Formula (1), Formula (2), or Formula (3), a resin, a polymerizable compound, and a polymerization initiator. In Formula (1), R101 and R102 each independently represent a hydrogen atom or a substituent, R103 to R106 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group, R107 to R111 each independently represent a hydrogen atom or a substituent, n1 to n4 each independently represent an integer of 0 to 4, n5 represents an integer of 0 to 6, X represents an anion or is not present, and at least one of R101, . . . , or R111 includes an anion; and in the case where R101 and R102 represent hydrogen atoms, R103 represents an aryl group having a substituent at at least the ortho-position.

公开(公告)号：US12038689B2

公开(公告)日：2024-07-16

申请号：US17212546

申请日：2021-03-25

Applicant: FUJIFILM Corporation

Inventor： Akihiro Kaneko ,  Kazunari Yagi ,  Takashi Kawashima ,  Akiyoshi Goto

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/18 ,  C08F220/28 ,  C08F220/36 ,  C09D125/18 ,  C09D133/10 ,  C09D133/16 ,  G03F7/004 ,  G03F7/30 ,  G03F7/38

CPC classification number: G03F7/0392 ,  C08F212/22 ,  C08F220/1808 ,  C08F220/1809 ,  C08F220/1812 ,  C08F220/1818 ,  C08F220/281 ,  C08F220/282 ,  C08F220/283 ,  C08F220/365 ,  C09D125/18 ,  C09D133/10 ,  C09D133/16 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/30 ,  G03F7/38

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes an acid-decomposable resin having a repeating unit represented by General Formula (1), and a compound that generates an acid upon irradiation with actinic rays or radiation.

公开(公告)号：US11953829B2

公开(公告)日：2024-04-09

申请号：US16797035

申请日：2020-02-21

Applicant: FUJIFILM Corporation

Inventor： Kazunari Yagi ,  Takashi Kawashima ,  Tomotaka Tsuchimura ,  Hajime Furutani ,  Michihiro Shirakawa

IPC: G03F7/004 ,  C08F212/14 ,  C08F220/28 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38

CPC classification number: G03F7/0045 ,  C08F212/24 ,  C08F220/282 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/322 ,  G03F7/38

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a repeating unit having a group in which a phenolic hydroxyl group is protected with an acid-leaving group; a first photoacid generator that generates an acid having a pKa of −2.00 to 2.00, in which in a case where the acid thus generated is a carboxylic acid, a pKa of the carboxylic acid is −2.00 or more and less than 1.00; and a second photoacid generator that generates a carboxylic acid having a pKa of 1.00 or more.

公开(公告)号：US20230087940A1

公开(公告)日：2023-03-23

申请号：US17955863

申请日：2022-09-29

Applicant: FUJIFILM Corporation

Inventor： Hironori OKA ,  Michihiro Shirakawa ,  Mitsuhiro Fujita ,  Kazunari Yagi

IPC: G03F7/039

Abstract: The present invention provides a pattern forming method with which a pattern having excellent LER performance is obtained. In addition, the present invention provides an actinic ray-sensitive or radiation-sensitive composition and a method for manufacturing an electronic device, which relate to the pattern forming method. The pattern forming method of the present invention includes, in the following order, an exposure step of exposing a resist film, the resist film including an acid-decomposable group a which reacts to generate a polar group having a pKa of 6.0 or more, an acid-decomposable group b which reacts to generate a polar group having a pKa of less than 6.0, and a photoacid-generating component, a first heating step for reacting at least a part of the acid-decomposable group a with an acid to generate the polar group having a pKa of 6.0 or more, a second heating step for reacting at least a part of the acid-decomposable group b to generate the polar group having a pKa of less than 6.0, and a development step.

公开(公告)号：US20210109446A1

公开(公告)日：2021-04-15

申请号：US17130054

申请日：2020-12-22

Applicant: FUJIFILM Corporation

Inventor： Akiyoshi Goto ,  Takashi Kawashima ,  Kazunari Yagi ,  Daisuke Asakawa ,  Akira Takada

IPC: G03F7/039 ,  G03F7/038 ,  C08F220/18 ,  C08F216/36 ,  C08F220/28

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition in which fewer defects are generated in any development treatment of alkali development and organic solvent development, a pattern forming method, a method for manufacturing an electronic device, and a resin. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a repeating unit represented by Formula (1) and a repeating unit having an acid-decomposable group, and a photoacid generator.

公开(公告)号：US10662332B2

公开(公告)日：2020-05-26

申请号：US15934365

申请日：2018-03-23

Applicant: FUJIFILM Corporation

Inventor： Takashi Iizumi ,  Kazunari Yagi ,  Keiichi Tateishi

IPC: C09B11/14 ,  C09D11/328 ,  C09B11/12 ,  C09B11/20 ,  D06P3/24 ,  D06P5/00 ,  C09B11/26 ,  C09B69/06 ,  D06P1/40 ,  D06P5/30

Abstract: Provided are a compound represented by any one of Formulae (1) to (3) described in the specification, a coloring composition for dyeing or textile printing including the compound, an ink for ink jet textile printing, a method of printing on fabric, and a dyed or printed fabric.

公开(公告)号：US09068290B2

公开(公告)日：2015-06-30

申请号：US14517926

申请日：2014-10-20

Applicant: FUJIFILM CORPORATION

Inventor： Kazunari Yagi ,  Yasuhiro Ishiwata ,  Yutaro Norizuki

IPC: D06P3/24 ,  B41J2/01 ,  B41M5/00 ,  C09D11/00 ,  C09D11/328 ,  D06P1/08 ,  D06P5/30 ,  D06P3/26 ,  C09B29/036 ,  C09B29/08 ,  C09B43/11 ,  D06P1/18

CPC classification number: D06P3/24 ,  B41J2/01 ,  B41M5/00 ,  C09B29/0051 ,  C09B29/0801 ,  C09B29/0809 ,  C09B43/11 ,  C09D11/00 ,  C09D11/328 ,  D06P1/08 ,  D06P1/18 ,  D06P3/26 ,  D06P5/30 ,  Y10T428/2481

Abstract: A coloring composition for inkjet textile printing, containing water and a dye represented by Formula (I) [R1 represents H, halogen, alkyl, aralkyl, aryl, heteroaryl, alkoxy, or cyano; R2 represents H, halogen, cyano, —COOR6, —COR7, —CONR8R9, or an ionic hydrophilic group; R3 represents alkyl, aralkyl, alkenyl, alkynyl, aryl, or heteroaryl; each of R4 and R5 independently represents H, alkyl, cycloalkyl, aralkyl, alkenyl, alkynyl, aryl, or heteroaryl; R15 represents H or a substituent; X represents alkyl, cycloalkyl, aralkyl, aryl, heteroaryl, —COR12, or —CONR13R14; R6 represents alkyl, aryl, or heteroaryl; each of R7 to R14 independently represents H, alkyl, aryl, or heteroaryl; and a number of ionic hydrophilic groups in one molecule is from 1 to 5].

Abstract translation: 用于喷墨织物印花的着色组合物，含有水和由式（I）表示的染料[R1表示H，卤素，烷基，芳烷基，芳基，杂芳基，烷氧基或氰基; R 2表示H，卤素，氰基，-COOR 6，-COR 7，-CONR 8 R 9或离子性亲水基团; R 3表示烷基，芳烷基，烯基，炔基，芳基或杂芳基; R 4和R 5各自独立地表示H，烷基，环烷基，芳烷基，烯基，炔基，芳基或杂芳基; R 15表示H或取代基; X表示烷基，环烷基，芳烷基，芳基，杂芳基，-COR 12或-CONR 13 R 14; R6表示烷基，芳基或杂芳基; R 7至R 14各自独立地表示H，烷基，芳基或杂芳基; 并且一个分子中的多个离子亲水基团为1〜5]。