Invention Grant
- Patent Title: Common electrostatic chuck for differing substrates
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Application No.: US17012275Application Date: 2020-09-04
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Publication No.: US11476097B2Publication Date: 2022-10-18
- Inventor: Vinodh Ramachandran , Ananthkrishna Jupudi , Sarath Babu
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01J37/32 ; H02N13/00

Abstract:
An apparatus, methods and controllers for electrostatically chucking varied substrate materials are disclosed. Some embodiments of the disclosure provide electrostatic chucks with variable polarity and/or voltage. Some embodiments of the disclosure provide electrostatic chucks able to operate as monopolar and bipolar electrostatic chucks. Some embodiments of the disclosure provide bipolar electrostatic chucks able to compensate for substrate bias and produce approximately equal chucking force at different electrodes.
Public/Granted literature
- US20210074523A1 Common Electrostatic Chuck For Differing Substrates Public/Granted day:2021-03-11
Information query
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