Invention Grant
- Patent Title: Method for forming oxide semiconductor film, semiconductor device, and method for manufacturing semiconductor device
-
Application No.: US17000580Application Date: 2020-08-24
-
Publication No.: US11489077B2Publication Date: 2022-11-01
- Inventor: Shunpei Yamazaki , Masahiro Watanabe , Mitsuo Mashiyama , Kenichi Okazaki , Motoki Nakashima , Hideyuki Kishida
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2011-117354 20110525,JP2011-147189 20110701
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L21/02 ; H01L29/66

Abstract:
The impurity concentration in the oxide semiconductor film is reduced, and a highly reliability can be obtained.
Public/Granted literature
Information query
IPC分类: