Invention Grant
- Patent Title: Method and composition for etching molybdenum
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Application No.: US17230633Application Date: 2021-04-14
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Publication No.: US11492709B2Publication Date: 2022-11-08
- Inventor: Atanu K. Das , Daniela White , Emanuel I. Cooper , Eric Hong , JeongYeol Yang , Juhee Yeo , Michael L. White , SeongJin Hong , SeungHyun Chae , Steven A. Lippy , WonLae Kim
- Applicant: ENTEGRIS, INC.
- Applicant Address: US MA Billerica
- Assignee: ENTEGRIS, INC.
- Current Assignee: ENTEGRIS, INC.
- Current Assignee Address: US MA Billerica
- Main IPC: C23F1/38
- IPC: C23F1/38 ; H01L21/3213
Abstract:
An etchant composition and method for etching molybdenum from a microelectronic device at an etch rate are described. A microelectronic device is contacted with an etchant composition for a time sufficient to at least partially remove the molybdenum. The etchant composition comprises at least one oxidizing agent, at least one oxidizing agent stabilizer, and at least one base and has a pH of from 7.5 to 13. The etchant composition selectively removes molybdenum at an etch rate of 5-200 Å/min.
Public/Granted literature
- US20210324525A1 METHOD AND COMPOSITION FOR ETCHING MOLYBDENUM Public/Granted day:2021-10-21
Information query
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