Invention Grant
- Patent Title: Managing dielectric stress of a memory device using controlled ramping slopes
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Application No.: US17119576Application Date: 2020-12-11
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Publication No.: US11494084B2Publication Date: 2022-11-08
- Inventor: Sheyang Ning , Lawrence Miranda
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Lowenstein Sandler LLP
- Main IPC: G06F3/06
- IPC: G06F3/06 ; G11C16/08 ; G11C16/10 ; G11C16/04

Abstract:
Control logic in a memory device identifies a request to execute a memory access operation on the memory cell. A first set of pulses corresponding to a first voltage ramp slope level is caused to be applied to the memory cell during a first time interval of the memory access operation. The control logic causes a second set of pulses corresponding to a second voltage ramp slope level to be applied to the memory cell during a second time interval of the execution of the memory access operation, wherein the first slope level and the second slope level are different.
Public/Granted literature
- US20220187995A1 MANAGING DIELECTRIC STRESS OF A MEMORY DEVICE USING CONTROLLED RAMPING SLOPES Public/Granted day:2022-06-16
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